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Superconductivity, Spintronics and Surface Science Center

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test.jpgFacilities
 

Infrastructure direct public link in ERRIS:

 

Physical deposition equipment

 

Hybrid UHV sputtering plant (6 targets, base pressure 2e-9 Torr) and UHV e-beam evaporator (7 pocket crucible, RHEED, base pressure 2e-10 Torr

DC/RF magnetron sputtering system having a base pressure of <2.10-8 Torr, equiped with 6 magnetrons for the deposition of magnetic and non-magnetic materials

   

Chemical deposition methods top

 
Laminar flow fume hood for the chemical deposition of thin films equipped with spinner, dip-coater and ultrasound baths
spinner
Deionized water equipment (0.1 micro Siemens)
deionized

Argon line for the synthesis of the moisture sensitive precursors

nisa argon
Rotary Evaporation by BUCHI with Vacuum Pump V-700.
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heating bath can be adjusted from +20°C to +180°C
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rotation speed 20–240 rpm Programmed vacuum (vacuum limit 10-7 Torr) or controlled atmosphere tube furnaces up to 1600oC
rotovapor
Tube furnaces up to 1600oC with controlled atmosphere (oxygen, nitrogen, argon).
furnance

Characterization equipments top

 
Bruker D8 Discover high resolution difractometer (theta-2theta scans, w-scan, grazing incidence difraction, reflectometry, polar figures).
Bruker
Cryogen free system
- variable temperature insert: temperaure range 1.5-300K;
- field range 7T;
- sample rotation option.
cryogenic free
Vibrating sample magnetometer
- vectorial option (angular remanence, Mx, My);
- automatic sample rotation;
- variable temperature even (70K-1000K);
- max. 23kOe (2.3T) magnetic field
.
vsm

Auger Spectrometer
- energy range 10 eV to 2,500 eV;
- resolution 1 eV to 10 eV electronically ajustable;
- resolving power 0.1 % to 0.6% electronically ajustable;
- analyzer modes dE=const. and dE/E=const., electronically ajustable;
- detection: lock-in technique and pulse counting technique.

auger spectrometer
Mask aligner SuSS MicroTec MJB4
Exposure Modes
Contact: soft, hard, vacuum, soft vacuum
Vacuum contact adjustable to 200 mbar abs
Gap exposure, adjustable gap 10 – 50 µm
Flood exposure, split exposure
Lamp control modes: constant power, constant intensity
Alignment Stage
MA movement range X: ± 5 mm
Y: ± 5 mm
Theta: ± 5°
Mechanical resolution X, Y: 0.1 μm
Theta: 4 x 10-5°
mask allinger
Atomic Force Microscopy (AFM)-VEECO
Contact mode; Tapping mode, Phase imaging;
Magnetic force microscopy;
Conductive AFM mode.
AFM
Resistivity measurement equipment in the range 77K-1300K. The setup is equipped with a Keithley 6221 current source and a Keithley 2182A nanovoltmeter.
resistivity inst

AC harmonic Hall and pulse magneto-electrical measurement system

 

Computer controlled/Labview system TG-DTA derivatograph with a temperature range between 20-1600oC.
TG-DTA
Quadrupole mass spectrometer 1-200 amu (Stanford QMS-200).
RGA
Zeiss optical microscope(x1000) with image acquisition and processing; Axio-Vision software for phase and grain size analysis.
optical microscope

FT-IR Spectrometer - Platinum - ATR - accessory, Diamond, 1 bounce, QuickLock
- Source: mid-IR range 7000 to 400 cm−1
- Wavenumber Accuracy 0.01 cm−1
- Signal-to-Noise (Minimum) 45.000:1 peak to peak or 250.000:1 RMS for 1 min.

    

 

FT-IR

Centrifuge Allegra 64R - Maximun spin speed: 26000rpm (56000 rcf)
- Operating temperature from 20ºC to 40ºC
- Spin tubes: 10x15ml
- Fixed angle: 30º
- Run Time 9 hr 59 min, hold

centrifugue